PRODUCT RANGE

Black....................CM-34449

NOTE:

CM-34449 is only available in black and is a stock product.

Please contact your Cudner & O'Connor technical representative on other applications.

Note: Information contained in Cudner & O'Connor printed matter is based on laboratory and field tests. Because we cannot control actual production conditions, no warranty is expressed or implied. Careful testing is always recommended prior to production. Consult our Technical Service Department on all application issues.

Glass and metal. 

CM-34449 is an asphaltum based acid etch resist designed to withstand etchants such as hydrofluoric acid, cupric chloride, ferric chloride, ammonium persulfate, and other etchants used in the subtractive chemical etching process..

CM-34449 dries through solvent evaporation.; methods employed are:

Ambient Air/racking: 30-45 minutes, depending on    air movement and general ambient conditions. Drying panels in the vertical or  diagonal position accelerates solvent drop-off. 

Forced Air: "Jet" dries in seconds with efficient conveyorized units producing 3000-5000 cfm with temperature settings of 120F-160F.

Convection/Batch Oven: Moderate temperatures with continual air exchange. If panels are racked in the horizontal position, care must be taken to ensure complete cure of panels positioned on center trays.

Removal: After chemical processing, the resist is removed using aromatic, aliphatic, chlorinated and ketone organic solvents. Removal is effected by immersion or spray applications of organic solvents.

110 to 260 mesh counts in monofilament polyester fabric. Stainless steel fabric can also be used. 

All types, 60 to 80 durometer.

CudnerCote Direct Emulsion, indirect Photo Films and Capillary Film. 

Reducer CMN-6 is recommended and should be used in moderation (2-5%). During hot and humid conditions CMN-7 retarder is recommended.  Reducer and retarder additions should be measured by weight.